
词语导航
基本信息
词语:刻蚀法
繁体:刻蝕法
拼音:kè shí fǎ
英语翻译
【电】 etching method
分词翻译
刻蚀的英语翻译:
【计】 etch
法的英语翻译:
dharma; divisor; follow; law; standard
【医】 method
【经】 law
翻译例句
1. 用电子束刻蚀法在晶片上镀上纳米级铝层形成了电感器。
Inductors were defined by electron-beam lithography and formed by depositing micron-thick aluminium metal onto the wafers.
2. 利用扫描刻蚀法在蓝宝石基片上加工了一个二维图形。
And then, a 2D pattern was ablated onto the sapphire substrate by scanning approach.
3. 介绍了两种制备多孔硅的方法:电火花刻蚀法和激光辐射腐蚀法。
Two new methods for porous silicon preparation i. e. spark erosion and laser irradiation erosion are reviewed in this paper.
4. 然后在氧等离子体中用电子束刻蚀法去除沟道区石墨烯形成晶体管的沟道。
They then defined the transistor channel using electron-beam lithography, removing graphene outside of channel regions with an oxygen plasma.
5. 本文采用X光电子能谱加氩离子刻蚀法,测出三种分散剂在煤表面吸附膜的近似厚度。
The thickness of absorbed films was measured for three CWM dispersants by X-rayphotoelectric spectrometer and argon-ion etching in this report.
6. 使用薄膜沉积法和离子束刻蚀法制作16阶菲涅耳透镜,应用于折衍混合CCD相机。
The 16-step Fresnel lens had been fabricated by thin film deposition and ion beam etching and it has been used in refractive-diffractive CCD camera.
7. 综述了二元光学元件的常用制作工艺技术,包括台阶刻蚀法、薄膜沉积法、直接写入法、准分子激光加工法和灰阶掩模法。
The common fabrication technologies of binary optical elements were expatiated, including etching, thin-film deposition, direct writing, excimer laser projection and gray-scale masks.
8. 制备金属光子晶体方法包括:电子束刻蚀结合后续剥离法、激光干涉光刻结合干刻蚀技术等。
The fabrication methods of MPC include electron beam lithography with subsequent evaporation and lift-off, interference lithography with dry-etching technology etc.
9. 在几种不同材料的试件表面刻蚀出了试件栅,这种技术的实现使云纹干涉法和精细网格法在高温高压环境下的广泛应用成为可能。
The realization of this teChnique makes it possible to apply the Moire interferometry and lattice method under high-temperature, high-pressure environments.
10. 运用相位掩模法刻蚀光纤光栅,该方法对光源的时间相干性和单色性要求较低,工艺简单,成品率高。wWW.WeNTIYi.COM
Fiber grating is manufactured by application of phase mask means, which is of low requirement of time coherence and monochromaticity for light-source, simple craft and high rate of finished products.
11. 运用相位掩模法刻蚀光纤光栅,该方法对光源的时间相干性和单色性要求较低,工艺简单,成品率高。
Fiber grating is manufactured by application of phase mask means, which is of low requirement of time coherence and monochromaticity for light-source, simple craft and high rate of finished products.
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